M Plan UV - Ultraviolet Radiation Range Objectives for Bright-Field Observation | MITUTOYO
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M Plan UV
Ultraviolet Radiation Range Objectives for Bright-Field Observation
M Plan UV
VMU / FS70
Features
> Bright-field observation/Ultraviolet observation/Laser machining
> Wavelength compensation 266 nm and 550 nm
> Infinity corrected
> Long working distance
> Plan
Specifications
| Model | Order No. | N.A. | W.D. (mm) | f (mm) | R (μm) (λ= 550 nm) |
±DOF (μm) | Real FOV (mm) | Mass (g) |
||
| f266 | f550 | ø24 Eyepiece | 2/3 Inch Camera | |||||||
| M Plan UV | ||||||||||
| M Plan UV 10X | 378-844-15 | 0.25 | 20.0 | 20 | 20.3 | 1.1 | 4.4 | 2.4 | 0.66x0.88 | 350 |
| M Plan UV 20X | 378-837-8 | 0.37 | 15.0 | 10 | 10.4 | 0.7 | 2.0 | 1.2 | 0.33x0.44 | 390 |
| M Plan UV 50X | 378-838-8 | 0.41 | 12.0 | 4 | 4.2 | 0.7 | 1.6 | 0.48 | 0.13x0.18 | 400 |
| M Plan UV 80X | 378-839-5 | 0.55 | 10.0 | 2.5 | 2.9 | 0.5 | 0.9 | 0.3 | 0.08x0.11 | 430 |
• When projecting a mask image on a specimen by using a YAG laser system mounted on a Mitutoyo microscope unit, the mask image will be scaled by the factor f/200 times (f=200 mm, Mitutoyo tube lens).
Since the focal length (f) in ultraviolet radiation (λ = 266 nm) is slightly smaller than that in visible radiation (λ = 550 nm) as above, the working area in ultraviolet radiation also becomes slightly smaller than the mask image in visible radiation.
• Every resolution and single objective's depth of focus in the above table is a value determined on the basis of a reference wavelength (λ= 0.55 μm).
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