M Plan Apo / M Plan Apo HR - Objectives for Bright-Field Observation (Long Working Distance) | MITUTOYO
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M Plan Apo / M Plan Apo HR
Objectives for Bright-Field Observation
(Long Working Distance)
M Plan Apo /
M Plan Apo HR
VMU / WIDE VMU / FS70 / MF-U / Hyper MF-U
Features
> Bright-field observation
> Wavelength compensation range 436 nm to 656 nm (Designed to fundamental wavelength 587 nm)
> Infinity corrected
> Long working distance
> Plan-Apochromat
> High-resolving power type (M Plan Apo HR)
Specifications
| Model | Order No. | N.A. | W.D. (mm) | f (mm) (λ= 550 nm) |
R (μm) (λ= 550 nm) |
±DOF (μm) | Real FOV (mm) | Mass (g) |
|
| ø24 Eyepiece | 2/3 Inch Camera | ||||||||
| M Plan Apo | |||||||||
| M Plan Apo 1X *¹ | 378-800-12 | 0.025 | 11.0 | 200 | 11.0 | 440 | 24 | 6.6x8.8 | 380 |
| M Plan Apo 2X *² | 378-801-12 | 0.055 | 34.0 | 100 | 5.0 | 91 | 12 | 3.3x4.4 | 240 |
| M Plan Apo 5X | 378-802-12 | 0.14 | 36.5 | 400 | 2.0 | 14 | 4.8 | 1.32x1.76 | 270 |
| M Plan Apo 7.5X | 378-807-3 | 0.21 | 35.0 | 26.67 | 1.3 | 6.2 | 3.6 | 0.88x1.17 | 280 |
| M Plan Apo 10X | 378-803-3 | 0.28 | 34.0 | 20 | 1.0 | 3.5 | 2.4 | 0.66x0.88 | 250 |
| M Plan Apo 20X | 378-804-3 | 0.42 | 20.0 | 10 | 0.7 | 1.6 | 1.2 | 0.33x0.44 | 330 |
| M Plan Apo 50X | 378-805-3 | 0.55 | 13.0 | 4 | 0.5 | 0.9 | 0.48 | 0.13x0.18 | 350 |
| M Plan Apo 100X | 378-806-3 | 0.70 | 6.0 | 2 | 0.4 | 0.6 | 0.24 | 0.07x0.09 | 400 |
| M Plan Apo HR | |||||||||
| M Plan Apo HR 5X *³ | 378-787-16 | 0.21 | 27.0 | 40 | 1.3 | 6.2 | 4.8 | 1.32x1.76 | 310 |
| M Plan Apo HR 10X *³ | 378-788-15 | 0.42 | 15.0 | 20 | 0.7 | 1.60 | 2.4 | 0.66x0.88 | 470 |
| M Plan Apo HR 50X | 378-814-4 | 0.75 | 5.2 | 4 | 0.4 | 0.49 | 0.48 | 0.13x0.18 | 410 |
| M Plan Apo HR 100X | 378-815-4 | 0.90 | 1.3 | 2 | 0.3 | 0.34 | 0.24 | 0.07x0.09 | 460 |
• Every resolution and single objective's depth of focus in the above table is a value determined on the basis of a reference wavelength (λ= 0.55 μm).
*1: When observing a workpiece whose optical reflectance is low, an appropriate polarizer should be used with this lens.
*2: When observing a workpiece whose optical reflectance is low, using this lens with a 1/4 wave plate and polarization unit (No.02ALN370) is recommended.
*3: These specifications apply to the objectives in isolation and may not apply when a lens is mounted in the revolver of a microscope, depending on the design of that microscope. In the case where the vertical epi-illumination is provided by the user it is important to balance the various optical parameters so that optimum illumination of the target surface is obtained.
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